Oxide Sputtering targets

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Oxide Sputtering targets

magnetic ceramic target

Evaporation Materials

Home >Oxide Sputtering targets

Aluminum Oxide Sputtering Targets (Al2O3)
Chromium Oxide Sputtering Targets (Cr2O3)
Hafnium Oxide Sputtering Targets (HfO2)
Indium Oxide Sputtering Targets (In2O3)
Nickel Oxide Sputtering Targets (NiO)

Silicon Dioxide (SiO2) Sputtering Targets
Tin Oxide (SnO2) Sputtering Targets
Titanium Dioxide (TiO2) Sputtering Targets
Tungsten Oxide (WO3) Sputtering Targets
Vanadium Dioxide Sputtering Targets (VO2)

Vanadium Oxide (V2O5) Sputtering Targets
Niobium Oxide (Nb2O5) Sputtering Targets
Tantalum Oxide (Ta2O5) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Targets
Zirconium Oxide (ZrO2) Sputtering Targets

Indium Tin Oxide (ITO) Sputtering Target
Indium Zinc Oxide, IZO (In2O3/ ZnO, 90/10 wt%) Sputtering Targets
AZO Sputtering Targets (Zinc Oxide with Alumina)
Barium Titanate (BaTiO3) Sputtering Targets

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Byland International

Tianjin Byland international is committed to supplying the magnetron Sputtering Targets , arcing cathodes and Evaporation material since established in 2011 .We are focusing on the Ti ,Cr,Zr,Al ,W,Mo,Ta ,Ni, TiAl ,CrAl , AlSnCu ITO, Fe3O4, TiC, Ta2O5, GeSe2 ect Metal , Alloy and Ceramic targets , the products have a widely application in the PVD or CVD thin film coating .

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Address:
No.26 Tianhai Road,ZiYa Economic and Technology Development Zone
jinghai Dist,TianJin,China 301699
300011
Mon-Fri from 9 am to 5 pm

Tel: +86-022-59510606

Phone: +86-18222131289

E-mail: hamer.lijier@gmail.com

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