Indium Zinc Oxide, IZO (In2O3/ ZnO, 90/10 wt%) Sputtering Targets

The IZO ceramic target (99.99% in purity and density) comprises 90 wt.% of ln2O3 and 10 wt.% of ZnO.  The direct current (dc) magnetron sputtering system is utilized for the film deposition.  Without/with the ion-assisted deposition (IAD) technique, the electrical, optical, and structural properties of these films prepared by different dc powers (such as 50 W, 80 W, and 100 W)  are an optimal IZO deposition condition which is developed for flexible organic light-emitting device (OLED) applications.
Our IZO sputtering target are available in a variety of sizes and shape in planar or cycle.