Indium Oxide Sputtering Targets (In2O3)

Indium oxide (In2O3) is a chemical compound, an amphoteric oxide of indium. It is extremely transparent and conductive. In2O3–ZnO films have been prepared by RF magnetron sputtering using targets composed of In2O3 and ZnO. The Zn content in the films could control the etching rate of In2O3–ZnO films when using HCl as the etchant.
Our Indium oxide (In2O3) sputtering target are available in a variety of sizes and shape in planar or cycle.