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Pure metal Sputtering Target

Alloy Sputtering targets

Oxide Sputtering targets

magnetic ceramic target

Evaporation Materials

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Boron Carbide (B4C) Sputtering Targets
Silicon Carbide (SiC) Sputtering Targets
Tungsten Carbide (WC) Sputtering Targets
Tantalum Carbide (TaC) Sputtering Targets
Titanium Carbide (TiC) Sputtering Targets

Silicon Nitride (Si3N4) Sputtering Target
Boron Nitride (BN) Sputtering Targets
Aluminum Nitride (AlN) Sputtering Targets
Titanium Nitride (TiN) Sputtering Targets
Zirconium Nitride (ZrN) Sputtering Targets

Tantalum Nitride (TaN) Sputtering Targets
Molybdenum Disulfide (MoS2) Sputtering Targets
Tungsten Disulfide (WS2) Sputtering Targets
Zinc Sulfide (ZnS) Sputtering Targets
Magnesium Fluoride (MgF2) Sputtering Targets

Titanium Boride (TiB2) Sputtering Targets
Zirconium Diboride (ZrB2) Sputtering Target
Cadmium Telluride (CdTe) Sputtering Targets

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Byland International

Tianjin Byland international is committed to supplying the magnetron Sputtering Targets , arcing cathodes and Evaporation material since established in 2011 .We are focusing on the Ti ,Cr,Zr,Al ,W,Mo,Ta ,Ni, TiAl ,CrAl , AlSnCu ITO, Fe3O4, TiC, Ta2O5, GeSe2 ect Metal , Alloy and Ceramic targets , the products have a widely application in the PVD or CVD thin film coating .

Contact

Address:
No.26 Tianhai Road,ZiYa Economic and Technology Development Zone
jinghai Dist,TianJin,China 301699
300011
Mon-Fri from 9 am to 5 pm

Tel: +86-022-59510606

Phone: +86-18222131289

E-mail: hamer.lijier@gmail.com

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