Aluminum Nitride (AlN) Sputtering Targets

Aluminum nitride (AlN) is a nitride of aluminum. Its wurtzite phase (w-AlN) is a wide band-gap (6.01-6.05 eV at room temperature) semiconductor material, giving it potential application for deep ultraviolet optoelectronics.
Our Aluminum nitride (AlN) sputtering target are available in a variety of sizes and shape in planar or cycle.