Aluminum Silicon (AlSi) Sputtering Targets

Sputtering technique are frequently used to create a thin film of Aluminum Silicon. The AlSi target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Aluminum Silicon in this case, to create a thin film of AlSi on the surface of the substrate.
Our Aluminum Silicon sputtering target are available in a variety of sizes and shape in rotary, planar or cycle.