Titanium Niobium (TiNb) sputtering target

Titanium Niobium sputtering target is fabricated by means of vacuum melting or power metallurgy. The typical Titanium content is 66% (approximately 50 weight %). It is an extraordinary superconductivity material and could be made into a variety of compound practical materials by conventional deformation and heat treatment process.
Our Titanium Niobium sputtering target are available in a variety of sizes and shape in rotary, planar or cycle.