Nickel Vanadium (NiV) Sputtering Target

Nickel vanadium NiV sputtering targets containing 7% vanadium has both advantages of nickel and vanadium, thus adhesive layer and barrier layer can be achieved at a time. NiV alloy is non-magnetic materials, which is conducive to magnetron sputtering. In the electronics information industry, it is gradually replacing pure nickel sputtering targets.
Our nickel vanadium NiV sputtering target are available in a variety of sizes and shape in planar or cycle.