Nickel Chromium (NiCr) Sputtering Targets

Nickel Chromium (NiCr) Sputtering Target are used for depositing nickel chromium alloy resistive film by PVD technology, the nickel chromium film has high resistivity, low temperature coefficient of resistance, high sensitivity coefficient and low temperature dependence. The resistive film of nickel chromium alloy is easily prepared,and PVD coating process is mature, and coating layer performance is excellent, therefore it is mainly used to deposit precision resistive films in hybrid integrated circuits, which can meet the performance requirements of resistive strain gauge sensitive films, and commonly used for preparing thin film resistance strain gauges.
Our nickel chromium (NiCr) sputtering target are available in a variety of sizes and shape in planar or cycle.